Water-based Cleaning Agent to be Featured at IMAPS 2018

SCSZESTRON, the global leading provider of high precision cleaning products, services and training solutions in the electronics manufacturing and semiconductor industries, will feature HYDRON® SE 200 at IMAPS 2018.

HYDRON® SE 220 is a pH neutral, water-based, single-phase semicon cleaning agent specifically developed for use in immersion and ultrasonic processes. HYDRON® SE 220removes flux residues from a wide range of semiconductor electronics, such as leadframes, discrete devices, power modules, power LEDs, flip chips and CMOS following the die attach process.

IMAPS 2018 will be held at the Pasadena Convention Center in Pasadena, California on October 8-11th. Stop by booth #304 and ask about our recent semicon Pulse of the Industry Survey. For more information or to register, please visit imaps.org.